A 275 nm microlaser active at ambient temperature

A research consortium* that includes scientists from INAC recently produced a deep-UV laser with record-breaking performance. The laser emits at 275 nm at ambient temperature, as opposed to 310 nm cooled to 10 K, making it the best-performing system in the literature to date. The key to this technological advance? Extremely simple optical resonators (micro disks) made of a thin (200 nm) layer of gallium nitride/raw aluminum nitride on silicon.

The advantages of the system include low cost and the use of proven selective silicon etching processes. In its current state, the laser uses optical pumping. However, the researchers are hoping to shift to electrical injection. Market applications for the technology could include biological diagnostics and water purification.

*CNRS, University of Montpellier, Paris-Saclay University

 
Contact: bruno.gayral@cea.fr

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