News :
April 01 2018
MINATEC a center for the arts and culture
- Innovation & Society
- Life @ MINATEC
- News
Taking a cultural tour of the MINATEC campus has probably never crossed your mind. Maybe now it will! The Grenoble-Alps University community created the “Campus des Arts” program in 2017 to promote the cultural interest of MINATEC and other sites. The program’s website lists some 40 works of art on Grenoble’s campuses and offers up […] >>
April 01 2018
Grenoble Institute of Technology gets new Communications Director
- Education
- Life @ MINATEC
- News
Éliane Ferlay took the reins of Grenoble Institute of Technology’s Communications Department at the beginning of February. Ms. Ferlay brings diverse career experiences (Alliade Habitat, the City of Albertville, Fondation Hôpitaux de Paris-Hôpitaux de France, etc.), including with multinational companies, and she is thrilled to come to higher education—a first for her. One of her […] >>
April 01 2018
Innovation: CEA still in the top-100 global innovators
- Innovation & Society
- News
For the seventh year running, Clarivate Analytics (formerly Reuters), has ranked the CEA among the top 100 global innovators. Only two other research organizations are on the list: Fraunhofer in Germany and ITRI in Taiwan. The rest of the ranking is populated by companies, including six in France: Alstom, Arkema, Safran, Saint Gobain, Thales, and […] >>
April 01 2018
FAME Master’s program strengthens ties with industry
- Education
- News
With a ten-year history and some 200 graduates, the FAME (Functional Advanced Materials and Engineering) Master’s program recently received the European Erasmus Mundus seal for the third time. The program, which is coordinated by Phelma with the support of seven European universities*, will be called FAME+ starting in September 2018. The curriculum will focus heavily […] >>
April 01 2018
Chips individually encrypted during fabrication
- Industry
- News
- Research
Leti and Mapper, an equipment manufacturer based in the Netherlands, recently announced a major innovation: an individual security code etched onto the metal interconnects of individual chips during fabrication. Mapper developed a multiple electron beam maskless lithography test machine, which Leti integrated into a standard 40 nm CMOS fabrication process. The machine can be adapted […] >>