News : MINATEC

A team of researchers from INAC, LTM, and Institut de Bourgogne showed that it is possible to map optical near-fi eld phenomena in silicon nanocavities without using combined optical-AFM techniques like near-fi eld scanning optical microscopy (SNOM). They did it using a camera, a regular microscope and 0.5 micron fl uorescent beads, achieving resolutions comparable […] >>

A gallium focused ion beam (FIB) was integrated into Leti’s ToF-SIMS spectrometer at its Nanocharacterization platform. The combined system makes it possible to analyze air-sensitive and very heterogeneous materials to depths of up to 100 microns. Research was conducted on air-sensitive lithium-ion battery electrodes and TSVs (through-silicon vias), whose composition is very heterogeneous. In the […] >>

Since this summer, Leti has been in charge of Inspire, an industrial evaluation program for nanoimprint lithography. The program’s launch was attended by over ten manufacturers, including Toshiba, Arkema, and STMicroelectronics. In addition, Austria’s EVG, who already hosts demo campaigns, plans to provide the program with one of its most recent nanoimprint machines by the […] >>

This summer, researchers at Leti fabricated the world’s first M&NEMS micro-accelerometers on 300 mm wafers, sending three crucial messages to the academic and industrial research and development communities. First, the research proved that MEMS, or microelectromechanical systems, can be fabricated on 300 mm wafers, the largest format used in microelectronics. This advance will give MEMS […] >>

Atomic layer deposition, or ALD, will be the central topic at RAFALD, a three-day workshop organized from November 16–18 by several Grenoble-based ALD experts. On the docket: materials, equipment, processes, and simulation—all for an audience of professionals from industry and academia plus students enrolled in engineering programs. 50 to 100 attendees are expected. ALD is […] >>