CIME Nanotech gets ion milling equipment

CIME Nanotech recently commissioned an ion-beam milling machine (from scia Systems GmbH) in its clean room. The €500,000 machine was financed in part (50%) by IRT Nanoelec. It will be used for both training and R&D. It has a Hidden spectrometer to track, monitor, and identify the material being etched in multilayer samples.

The ion beam is 218 mm in diameter and can be used to etch magnetic materials for MRAM, metals for contacts, piezoelectric materials, and oxides. The sample holder, which rotates and inclines to prevent particles from being deposited on the substrates, can handle substrates up to 150 mm in diameter.

Contact: delphine.constantin@grenoble-inp.fr

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