CIME Nanotech gets new lithography machine

CIME Nanotech recently acquired a new lithography machine that performs two innovative processes. The first, nano-printing with control of the pressing and separation stage via an actuator matrix, reduces the number of defects compared to manual pressing and separation. The second process enables resin-free lithography using plasma situated between the substrate and mask, making it suitable for substrates that do not tolerate photosensitive resins or exposure to UV rays.
The equipment was financed in part by the IRT NanoElec research institute and is already being used by researchers from LTM and Leti for research and training in spintronics and surface functionalization for fluid MEMS, for example.

Contact: delphine.constantin@grenoble-inp.fr

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