Unbroken layers of MoSe2 over large surfaces now possible

Molybdenum diselenide (MoSe₂) has good optical properties, but is resistant to deposition processes. Microelectronics researchers had all but given up on the material, but research recently conducted by three physics labs at IRIG could change that. The researchers obtained an unbroken and uniform layer of MoSe₂ using molecular beam epitaxy on a graphene substrate. The grains’ crystalline quality is good, and their orientation is the same as the graphene grains. The material can absorb up to 15% of the light spectrum.

Applying the technique to 300 mm wafers is not yet within reach, however: The results were obtained on a surface measuring just 1 cm². Nevertheless, the process can be implemented on a large scale and could be more effective than the exfoliation and attach processes currently used on MoSe₂. The research was published in ACS Nano.

Contact: matthieu.jamet@cea.fr

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